Powall offers research & development services and licensing of IP on scalable production of nanostructured materials based on atomic layer deposition (ALD). ALD is a chemical deposition method to obtain conformal coatings of controllable thickness on many types of substrate. Together with the Powall intellectual property and know-how on scalable production of nanostructured materials, this allows for efficient precursor use for catalysts, encapsulation of battery particles for improved durability, controlled release of medication, and many more applications. Don't hesitate to contact us on info@powall.com for more information.
Location: Netherlands
Investors 1
| Date | Name | Website |
| - | Delft Ente... | delftenter... |
Mentions in press and media 1
| Date | Title | Description |
| 24.05.2024 | Dutch-based Powall raises €3M to advance sustainable energy materials with ultra-thin coating tech | Read this article in: Delft-based Powall, a company that offers R&D services and IP licensing on scalable production of nanostructured materials, has secured €3M in a follow-up investment round. The funding came from existing investors ... |